Dynamical And Control Co-simulation Of Wafer Stage

Step-scan lithography is one of the most important and high-end equipments for theIntegrate Circuit(IC) manufacture, and wafer stage is one of the key subsystems oflithography. The high-speed movement and ultra-precision positioning of the wafer stagerequires for high stability and reliability of the system. So research on the dynamicalperformance is of high importance.Based on analysis of the structure and working principle of wafer stage, the modelingmethods for some key parts and connections between them are discussed, and the dynamicalmodel is set up. According to the wafer stage’s functional requirements, its trajectory isestablished. In order to achieve the quick, smooth, steady, and precise positioningperformance for wafer stage, a positon/velocity PID control is designed. As the wafer stagesystem has the characteristics of high motion freedoms, multiple control variables andcomplex motion path, I build the control model in MATLAB/Simulink. Finally, the dynamicalmodel and control system are combined through the software interface between ADAMS andMatlab/Simulink, and the Co-simulation model is realized.After dynamical analysis, it shows that the balance’ pose can be in the target range by therole of active control in the motion process. Furthermore, a new structure of wafer stage isproposed, and simulation results shows that the new structure can make less vibration impactto other parts in the premise of balance’s expected moving rang.