Research Of The Macro And Micro Control About Wafer Stage

Lithography is the basic for the scale integrated circuit manufacturing technology, micro-optics and micro mechanics technology; It decides the big integrated circuit integrity; Macro and micro control system of Lithography equipment is the key to realize precise positioning.This paper studied the key technical problems about the lithography. The main contents of the study include:established mechanical dynamics model of the control system for the wafer stage, analyzed the force of the coarse-fine channels in order to get state space expression and used pole placement and LQG/LTR control strategy for simulation; Considered the nonlinear factors of the system and established the nonlinear coupled model of the control system for the wafer stage, and then simulated with Sliding Mode Algorithm. In the actual control systems , the main problems are the effects of temperature and disturbing force(Interference force).In order to solve the problems,appropriate solutions are put forward. Finally, study the feasibility of this solutions.Precision servo control system of wafer stage for lithography is a high positioning accuracy, high response speed, almost no overshoot of the servo system, The main contributions of this paper are the control methods of the lithography. With the help of the simulation, the macro and micro control system has higher control precision, faster response capability and maintain the system has invariance when the parameters of the system change.