Research Of The Synchronization Control System For The Lithography Wafer Stage And Reticle Stage

Step&Scan lithography Research and Development work has become one of themajor science and technology. Originated from wafer stage and reticle stage oflithography control system, this paper discusses the designer of synchronizationcontroller to satisfy the task schedule of exposure scanning, data transmission and thesynchronization deviation of wafer stage and reticle stage.Firstly, this paper summaries and points out some important phases in thedevelopment of lithography technology, Highlights the progress of synchronizationcontrol of lithography.Secondly, by analyzing step-by-step scanning exposure progress of Step&Scanlithography, this paper divides the subsystems which are related to exposure into hostsystem and slave system, and divides the exposure process into five states depending onthe task. The host system manages the tasks and controls the actions in slave systemsthrough the conversion of internal state.This paper designs a mechanism for data and status flags by the characteristic ofhardware connections and transmission of different data types. FIFO queue with a statetimer is used to broadcast synchronization status and data through a synchronizationcontrol bus defined in VME bus.A synchronization control card is designed considering the requirement of the hostsynchronization control system. This paper tests the transmission between the lowercomputer and the synchronization control card, between the synchronization controlcard and the slave system.Finally, this paper designers a synchronization arithmetic based on repetitivecontrol method which effectively reduces the synchronization deviation during the scanand exposure period, keeps the tracking accuracy and dynamic characters in themeanwhile. Simulation results show that the synchronization deviation can be reducedeffectively.