Establishment And Validation Of Mathematical Model For Lithography Wafer Stage

Lithography is one of the most important and complicated key equipments for theUltra large scale integrated circuit fabrication, it keep this large semiconductor systemsto steady and rapid progress. The twin ultra-precision stage system is the result of theultra-precision stage technology breakthrough dual to the development and evolution ofthe science and technology. The twin ultra-precision stage system plays a veryimportant role in the lithography. Its positioning accuracy impact on the quality of thesilicon.In this thesis, first analyzed the air springs ready for further structural analysis job.Then do the job of mechanical analysis for the balance mass, make the equation ofmotion. In the limit of the springs and dampers, the balance mass’s movement feature isthe second-order vibration damping. the displacement is small relative to the microstage displacement is very small. It meets the design requirements of the structure. Dueto the constraints of the balance mass, I analyze balance mass’s six degrees of freedommotion characteristics, and established a six-DOF motion equation.Also analyzed the micro-stage’s six-DOF of gesture. Decoupling the forces andmoments in all directions, established a six-DOF motion equation, attitude changesthrough software emulation.Next used the finite element software to analyze the structure to initially verify theaccuracy of the model. For the balance mass, the model frequency from finite elementsoftware model analysis compare with the result of theoretical calculations, the error issmall. Used the finite element software to analyze the air feet, the result is same to theresult of theoretical calculations. The results of software simulation is same to theresults of theoretical results.In the end, designed many experimental methods to analyze my theoretical model,such as a method to measure the effect of vibration isolation system; a method tomeasure the micro-stage’s six-DOF displacements.