Continuous Dynode Of Advanced Technology Microchannel Plate Research

Advanced technology of microchannel plates, AT-MCP, is a newtechnology of MCP process, which proposed by Galileo Co. early in 1990s. The channel wall continuous dynode formation is one of AT-MCP manufacture essential technical. The AT-MCP biggest breakthrough is separate the_precursory material and the dynode choice of material, at the same time also separates the pore array and the continual dynode manufacture craft. Therefore the AT-MCP wall continuous dynode formation have the merit about the choice of material scope widely, the craft flexibility is extraordinary and so on.According to the above, this article has mainly studied the continuous dynode material emission characteristic. Further explored AT-MCP to form the craft, The experiment uses the multiplex induction coupled plasma (ICP) etch system to form the pore array, using LPVCD in the deep channel wall form the polytropism Si thin film to take the continual dynode conducting layer, using the hot oxidized craft to form the SiO₂ secondary electron launch again to multiply film, preparing the certain performance the AT-MCP sample. Finally surveys MCP the characteristic parameter of electron gain and so on using the MCP characteristic test system, In order to further studies the secondary emission coefficients of secondary emitter, independently designs two secondary emission measurement system, this system will have the guiding sense from now on about the secondary emission research.