Research On Dynode Performance Of Silicon Micro-channel Plate

Silicon micro-channel plate is a new technology, which proposed in 1990s. Based on the semiconductor process technique, the new-style continuous dynode device can perform electron multiplier. Comparing the new process with the traditional method, there are two characteristics. First, selecting the materials of substrate and dynode are not limited. Second, preparation of the micro-channel array and continuous dynode is respective.In this thesis, the continuous dynode material emission characteristic of silicon micro-channel structure has been mainly studied, and method of dry and wet methods to prepare The dry method is that a layer of silicon was deposited by LPCVD on SiO₂ as a conductor layer that had several hundreds of nanometers thickness. has been mainly studied. It was formed on the surface of silicon conductor layer by wet oxygen process. The wet method is to use magnesium acetate to prepare MgO thin film by the sol-gel method, and the inner surface of silicon micro-channel preparation with a secondary electron emission properties of MgO thin film.