Investigation Of Microchannel Plate Film Dynode And Secondary Electron Emission Characteristics

Microchannel plate(Microchannel plate, MCP) is a large-array microchannel electron multiplier. MCP is composed of many pore structure in accordance with particular form arrayed. Microchannel arrays have special structure, so they have played an important role in MCP and micro total analysis instrument and so on. Microchannel plate film dynode structure is an important part of the microchannel plate device, and therefore the structural characteristics of thin-film dynode have attracted attention of number of researchers. In this paper, microchannel plate film dynode structure was designed and the layer materials of thin films dynode were selected. Eventually, the film dynode structure was made of the Si substrate / conductive layer(PolySi) / emission layer(SiO2) or Si substrate / conductive layer(ZnO / Al2O3, AZO composite film) / emission layer(SiO2) or Si substrate / conductive layer(ZnO / Al2O3) / emission layer(Al2O3). Low pressure chemical vapor deposition(LPCVD) and atomic layer deposition(ALD) were used to prepare thin films dynode materials. High resistance tester and atomic force microscopy and X-ray diffraction were used for the thin film analysis. AZO composite films prepared by ALD were better than amorphous Si prepared by LPCVD. AZO composite film was more suitable for microchannel plate film dynode conductive layer material. Meanwhile, the test scheme of secondary electron emission coefficient of microchannel plate film dynode emission layer has been proposed. The experimental simulation of secondary electron emission characteristics was done for further research. Si was as a substrate and SiO2 was as film dynode. The relation of secondary electron emission coefficient and angle and electron energy was confirmed.