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Study On Chemical Mechanical Polishing And Shaping Of Silicon Microchannel Plate

Posted on:2016-04-22Degree:MasterType:Thesis
Country:ChinaCandidate:H B LiFull Text:PDF
GTID:2348330503493170Subject:Microelectronics and Solid State Electronics
Abstract/Summary:PDF Full Text Request
Microchannel plate made by silicon materials become a research hot spot in China and abroad. Silicon microchannel plate has more advantages such as high resolution, high aspect ratio, high electron intensity, low power consumption compare to traditional microchannel plate, it is widely used in ion detection, LLL night vision fields and others. Through experiments, the chemical mechanical polishing and shaping of structure microchannel plate process was optimized, which includes following aspects:(1)Microchannel arrays was protected by using vacuum filling wax method, chemical mechanical polishing and wax cleaning process was optimized and polished the silicon microchannel plate.(2)Process of shaping of silicon microchannel plates arrays structure was studied,the process was optimized and made a square shape silicon microchannel arrays structure.(3)Microchannel equal diameter region on silicon was studied and test ratio of the region after chemical mechanical polishing, the process was optimized, a higher ratio of equal diameter region and a better structure was made.
Keywords/Search Tags:Silicon microchannel plate, Chemical mechanical polishing, Shaping of structure, Tetramethylammonium Hydroxide, Wet etching
PDF Full Text Request
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