The Study On Fully Structure Release And Shaping Technology For Silicon Microchannel Array

Micro-channel Plate belongs to Ⅲ generation low light level image intensifier, which plays important roles in a wide range of application areas and is drawing much attention nowadays. This paper focus on the fabrication processes of structure release and the influence of anisotropic etching on morphology for silicon microchannel plate.(1)Presented a new fabrication process to realize silicon microchannel array fully structure release. The silicon struceture can be released by chemical mechanical polishing insteading of wet etching. It not only reduces fabrication processe, but also increases(2)The study on the influences of temperature and concentrations on morphology of TMAH anisotropic etching for silicon microchannel plate. The results indicated that the perfect orthogonal array of pores with sharp edges and corners can be obtained at more than40℃in lwt%TMAH solution.