Research On Integrated Circutt (IC) Lithography Process Planning System Based On Knowledge

IC (Integrated Circuit) process development was a long process routine, with highly level of complexity environmental experience. In order to solve the existing problems in IC process planning such as the difficulty of summarize knowledge referred, solving problems, and reusing already existing case knowledge, the development of intelligent IC process planning tool was placed in front of us. With the rapid development of IC planning industry, how to develop an intelligent platform that could shorten the period of manufacturing, improve the response capability, the efficiency of IC planning, the efficiency of IC planning and the level of automotive process planning. In this paper new ideas were proposed to solve these problems, that in the platform the IC process planning should be knowledge based, IC process planning referred knowledge bases should be included to support the intelligent planning process of IC process. Based on these ideas, a lot of research carried out in the IC planning enterprise, many lithography process planning books were referred. I organized and in-depth analysis the lithography planning process and systematic research key problems such as the presentation of knowledge, similarity algorithm. At last an IC lithography planning system based on knowledge was built to improve the percent of knowledge reused and efficiency of planning.The main work of this paper was as follows:1, Discusses the research background and significance of this issue, analysis of the current IC lithography process planning and other aspects of problems such as knowledge reuse, and present the significance and necessity of introduce KBE technology into lithography process planning, according to existing shortcomings and deficiencies in current IC process planning.2, Analysis functions needed in IC lithography process planning system, constructed the framework of process planning system based on cases of lithography process and analysis the specific function of modules, even the logical relationship among them. Research on existing lithography process cases to classified the knowledge and adopted structured object-oriented expression to express the referred process knowledge.3, Research on SM algorithm of lithography process planning cases. Fuzzy SM algorithm was introduced. A new algorithm named AFSM was proposed based on Gaussian membership function instead of triangular membership, in order to solve the deficiencies of traditional FFSM algorithm and membership based FFSM algorithm, and adjusted parameter was introduced to solve this problem.4, According to the research of lithography process planning, we combined SM algorithm with the needing, realized the automation set of lithography manufacturing flow, process parameters calculation and selection of lithography equipments. Lithography process planning system was developed based on the KBE technology and analysis of process planning demanding. At last, take UV thick photo resist lithography technology as an example to verify the validity of the proposed method and the system.The successful running of the lithography process planning system verified the validity of ideas proposed. In the last of this paper, reviewed the content of the paper and prospected for the future research.