Research On Knowledge Driven Intelligent Lithography Process Design For Integrated Circuit

Nowadays,in the information and knowledge-driven "knowledge economy" era,the inheritance,integration,management and innovation of knowledge in all areas has become an urgent problem.Product design and development driven by knowledge,has drawn more and more attention.The integrated circuit process development has some special characteristics such as long process route,highly complex of process development,and process design is related to the process environment.Existing IC process design has some unsolved difficulties,such as the difficulty of knowledge summary,the difficulty of problem solving,and the difficulty of knowledge reuse.Therefore,the development of intelligent IC design platform has become an urgent requirement in IC process design.With the rapid development of IC design industry,how to develop intelligent system of IC process design,improve the rapid response capability of manufacturing cycle,improve the efficiency of the IC design,and how to improve the level of automation of the design process have become urgent problems.From the perspective of employing the artificial intelligence algorithms in IC process design,this thesis proposed a knowledge driven intelligent design method for IC process design by introducing the knowledge engineering technology into IC technology design process.Based on above and takes lithography process design as the object of study,the IC lithography process knowledge model,the construction method of IC lithography process library,the conflict resolution mechanisms of obtained case knowledge,the comprehensive matching method and the adaptive case based reasoning method of IC lithography process were proposedThis thesis analyzed the characteristics of IC lithography process knowledge,and used the method and technology of knowledge engineering,and proposed the knowledge driven intelligent design method of process to achieve the intelligent support of IC lithography process design by the existing process cases.The main results of the thesis are as followed:1.Proposed the IC lithography process knowledge modeling and acquiring method;Analyzing the case knowledge of IC lithography process,classify the lithographic process design knowledge and use the structured object-oriented knowledge representing method to represent the IC lithography process cases consistently.2.Proposed the conflict resolution method for the multi-source heterogeneous knowledge in the IC lithography process case base;In order to solve the semantic level knowledge fusion problem of the multi-source heterogeneous knowledge in the IC lithography process case base,proposed the method of multi-source heterogeneous knowledge semantic level knowledge fusion.According to the inscape of IC process case knowledge,divide the conflicts into terminology conflict,predicate conflict,quantitative phrase conflict,relation conflict,and propose the conflict resolution methods as: logical Tree fusion method,frequency fusion method,selected fusion method,constraint fusion method,and relationship fusion method.3.Proposed the intelligent matching algorithm of timing IC lithography process and the method of generating of an IC lithography process scheme;For the reason that the different steps of IC lithography process are interacted,by analyzing the correlation and collaborative of each steps,this thesis proposed the intelligent matching algorithm of timing IC lithography process,classified the IC lithography process cases which have similar relationship as a class,and achieve a similar relationship clustering for IC lithography process cases,providing a reference solution for the design process.On the foundation of case knowledge clustering method,this thesis take process cases as base,guiding by the demands of design,using artificial intelligence algorithms as tool and achieving the intelligence generationof IC lithography process cases to get a reasonable solution.4.The prototype system development and case analysis.Develop the knowledge modeling module of IC lithography process cases and the Intelligent Process Design System which consists of knowledge driven intelligence generation modules of IC lithography process.Taking the IC manufacturing company’s demandings as example to verify the models and methods proposed in this thesis.