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The Research On The Processing Of N Surface Emitting 980nm VCSEL

Posted on:2012-10-07Degree:MasterType:Thesis
Country:ChinaCandidate:D Y GeFull Text:PDF
GTID:2218330338965898Subject:Physical Electronics
Abstract/Summary:PDF Full Text Request
Vertical cavity surface emitting lasers (VCSEL) is a type of semiconductor lasers, and this kind of lasers has many advantages with the traditional Edge-Emitting Laser. The traditional VCSEL is usually P surface emitting, because the cavitation effective quality of the P face is big and produced a lot of the joule heat. Affect the performance of the device.In response to this problem we design and preparation n surface emitting of flip chip 980nmVCSEL,focuses on the techotogy,mainly include:(1)Put forward a new kind of bridge structure electrode radiation oxides limit window, and design the photomask.(2)Etching by comparison to determine the corrosion fluids as H3PO4:H2O2:H2O=1:1: 10 of phosphoric acid solution, average corrosion rates for 0.14μm/min at 0℃.(3)Oxidation process of temperature and time of the gradient control solves the problem of chip crack.Finally, the devices do performance parameters of the test, the device at room temperature (22℃) for the threshold current 400mA, devices in the 30°c minimum, of the threshold current is about 370mA; peak wavelength for devices, the half-peak width 983.42nm as 0.92nm. When injected current when the device has reached the 1.8A peak power 730mW. Photoelectric conversion efficiency 25%; in addition to the film and put a pipe after near-field to far-field optical field tests, test results, better quality spot light intensity distribution, beam shaping is good, near-field to far-field beam and beam-almost, divergence between the plus or minus 20 degrees.
Keywords/Search Tags:Vertical cavity surface emitting lasers, radiation bridg, wet etching, selective oxidation
PDF Full Text Request
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