Study On The Wet Oxidation Process In Vertical Cavity Surface Emitting Laser

Vertical cavity surface emitting laser(VCSEL), is a new type of semiconductor lasers with low threshold current, low power consumption, high efficiency and small divergence angle of the advantages of optical communication and optical interconnects in the fields of a wide range of applications.During the VCSEL fabrication process, the wet oxidation is a key techniques for making high performance VCSEL. In order to accurately control the oxidation aperture, wet oxidation experiment of samples were carried out in the paper. Wet oxidation experiments are carried out upon the samples of etching oxidation mesa at different temperatures, and micro-probe analyses are made at different oxidation depth by sanning electron microscope, the oxidation date is derived at constant temperatuce. We studied the reason of cracks in the oxidized layer, and resolved the influence by using some new techniques.We finded a optimized condition for wet oxidation and prepared n surface emitting of980nm VCSEL with good performances.