A Design Of Structure And Simulate Of Characteristic Of Bulk-conductive Microchannel Plate

For the traditional microchannel plate (MCP) made by silicate glass, it must take the hydrogen heat deoxidize to make an electric layer on the surface of the channel wall, for the purpose of make sure there is enough conductivity of the silicate glass. But after a long period of bombardment by electrons, the ability of emitting and replenishing of electrons of this layer will reduce; the more important is, during the hydrogen heat deoxidize there will be plenty of hydrogen stay on the channel wall, which will ionize by the electron bombardment, and then form a positive ion feed back. If use a ion film, the signal will be attenuated as well as the Signal Noise Ratio(SNR). So we can conquer the disadvantage by using the bulk conducting glass, it can change the status which the traditional MCP is hard to improve among the gain, dynamic characteristic and the noise at the same time.In this dissertation, a research has been made on this bulk conductive MCP. It introduces the theory, structure and the development of MCP. Analyzed the characteristic of microchannel and discuss the advantage, structure and characteristic of this bulk conductive MCP.In this dissertation, we educe the academic formula of the gain of this bulk conductive MCP by using the traditional analytical method of MCP, protract the curve of gain and Length to Diameter Ratio. Analyzed the current transfer characteristic, new pulse power supply mode and the electric field distribution of bulk conductive MCP. Explain the reason of non positive ion feed back of this bulk conductive MCP, and find its component by using X-ray Photoelectron Spectroscopy(XPS).