A New Type Pattern Generator Based Research On A Graphic Data Conversion Program For Electron-Beam Lithography System

Data conversion is a significant part in electron-beam lithography system. Itsaccuracy and efficiency deeply influence the accuracy of lithography. Based on OurCutterV1.0, this thesis is mainly concerned with designing and implementing a program capable of converting the data from cif format to DY51 format, which is a special data format defined for a new type pattern generator.This dissertation includes two parts. The first one describes problems of some modules in OurCutterV1.0, and provides corresponding solving methods and algorithms. This part exists in Chapter 2 and Chapter 3. In the second one, a new type primitive-Conic Primitive is introduced. Based on it, the author proposed a new intermediate shape as the process object of a series of algorithms that make the program easily convert the patterns with conic curves into a set of conic primitives, without approaching the conic curve with a set of little chords. These new-defined data format and algorithms provides a basis for making wider use of the conic primitive in electron-beam lithography. The detail of this part of work is given in Chapter 4 and Chapter 5.