Research Of The Exposure Software For Novel Pattern Generator With DSP Chip As Key Component

In this thesis, the software in terms of exposure is mainly discussed with the whole softwaresystem presented.This paper introduces the development of electron beam lithography around the world andbasic fundamentals of pattern generator. Further analysis and research to both TI'sTMS320VC33 DSP chip and development of software is given according to the existingproblem of pattern generator. Besides that, the software system in the novel type of patterngenerator which use DSP chip as CPU is divided into two parts to study: the upper and thelower.The first part is the software locating on the upper, the PC. The paper finished the definitionof the files, PPF, EDF and the format of data transmitted, based on the formats of CIF, GDSIIetc. After comparison with several other interfaces, the USB2.0 is chosen as the one for theupper and the lower and proved that it worked well with the system driver and the programfulfilled the basic function.The second part is the algorithm of cells locating on the DSP, the lower. The new algorithm isproposed based on the study of formers' work. The algorithm is realized by trying to turn theoperations into plus, minus and multiplication and amending in someway. The result provedto be satisfied. This algorithm not only fits the performance of hardware such as DSP chipsbut improves the generation speed and precision of primitives as well with the efficiencycomparable with Bresenham.This thesis focuses on the software part of pattern generator and analyses its structures and fundamentals. And the research of the exposure control program and the algorithm of cells are the core part of this thesis.