The Research And Realization Of A New Kind Of Pattern Generator Based On DSP Chip

Electron beam lithography (EBL) is widely used for the fabrication of devices with sub-micron and nano-meter dimensions. As the key part, Pattern generator plays an important role in the system. In order to improve pattern accuracy and reduce exposure time, we developed a new kind of pattern generator.In this thesis, a versatile DSP-based pattern generator for e-beam lithography system is presented. We chose DSP as the key part of the pattern generator. Making good use of the parallel design of algorithm and multi data stream, the reasonable assignment and schedule of tasks and the permissible effective program design, we fulfilled the real-time digital signal processing of pattern generator.According to the requirement of different function and performance, we formed the system with a certain hardware configuration, including interface unit, memory extension unit, mark signal detection control unit, expose control unit, e-beam blanker control unit.The module has the advantages of flexible configuration, high programmable ability and expansibility.