Computer-Aided Design And Realization Of Complex Functional And Patterned Electron Beam Lithography Layouts

Electron beam lithography has become a obbligato technology for researches of force,heat,sound,light and electricity at nanoscale because of its advantages,such as maskless,high resolution and flexibility.As the development of nanostructure researches,the integrated functions of micro/nano-structures are increasing rapidly,which induces their geometries become more complex than before.This poses a challenge for the design of layouts which relies on software such as AutoCAD or L-edit.Therefore,how to effectively design and optimize exposure layouts has become an important research topic in the field of micro/nano-fabrication.Based on the challenges mentioned above,we proposed a method of using computer programming to assist the design of layouts to achieve high resolution electron beam fabrication.The main research contents of this thesis are as follows:(1)As a new micro/nano-fabrication technique,"sketch and peel" lithography(SPL)has significantly improved the efficiency of pattern processing for electron beam lithography.Based on MATLAB platform,we developed a program to extract the edge of digital images and convert them into layouts which are applied to SPL.The program preprocessed the digital image using image grayscale and adaptive threshold segmentation algorithm.Then the MATLAB bwboundaries function is used to track the image boundaries.Finally,the layouts are generated by GDS toolbox.The experimental results proved the validity and compatibility of layouts generated by this method with SPL.Further experiments have been done to confirm the feasibility of SPL in complex pattern by using this method.(2)Based on the aluminum plasmonic structural color,transmissive high-resolution full-color nano-printing is achieved by coding a layout generation program.A palette covering most of the visible light colors is realized,when we adjusted the period and size of the vertically coupled Al nanohole/nanodisk arrays.Using the achieved palette,we designed and coded a program to convert colorful images into layouts,enabling full-color printing of nanohole/nanodisk arrays.Meanwhile,the optical behavior of the structure was systematically studied by both experimental and theoretical methods.The results indicate that the local surface plasmonic resonance of the nanohole arrays plays a key role in the extraordinary optical transmission phenomenon of the system,and the coupling of the nanodisk and nanohole is important for the enhanced transmission.Compared with the existing transmissive plasmonic color filters,the structure has the advantages of a simple fabrication process and using cheap aluminum materials and has the potential for largescale applications in the fields of full-color nanoprinting and anti-counterfeiting.