| o meet the microelectronics industry's increasing demands for high-throughput, high-resolution electron beam lithography and microscopy, new electron sources with improved properties are required. Negative electron affinity photocathodes have a number of qualities that make them an exciting electron source for future electron beam instruments. Their emission surface is flat and uniformly sensitive to red and infrared light, facilitating the creation of arrays of independently modulated electron beams which could greatly speed electron beam lithography. Their low energy spread, low emission noise, and low angular spread are also well known. Key issues unresolved in previous work were maximum brightness, minimum energy spread at room temperature, and stability in electron guns compatible with commercial column technology. Our measurements in sealed tubes have demonstrated a brightness of... |
