Optimization Design And Laser Processing Technology Of Scattering Dot For Side Entry Light Guide Plate

Liquid crystal display(LCD)has been widely used in 3C products,such as automobiles,digital watches,mobile phones and computers,due to its advantages of small size,low radiation,low energy consumption,good optical display effect and high image quality.The light guide plate is a key component of the liquid crystal display module which research and development of the light guide plate plays an important role in improving the brightness and uniformity of the liquid crystal display.Therefore,the design and research of the light guide plate plays an important role in breaking the monopoly of traditional foreign manufacturers and improving the independent innovation capability of the country.The imprint printing and ink printing were the mostly used processing technology for light guide plates production,and in every square light guide plate,there are tens of thousands scattering dots.With the increasing demand for large-size liquid crystal displays,the existing technology has been unable to meet the processing requirements.Due to the advantages of fast processing speed,high precision and wavelength level of the laser,laser etching technology is particularly suitable for processing high-density scattered dot,and gradually becomes the main way of diffused dot processing of the light guide plate Therefore,it is of great significance to further optimize the processing technology of laser etching light guide plate.In this thesis,the distribution of the scattering point of the light guide plate was optimized,and the influence of the shape of the scattering point of different light guide plates on the light uniformity and intensity were also studied.The paper is divided into three parts.The first part introduces the light guide plate working principle,the scattering point distribution theory and the principle of laser processing.The second part is the simulation analysis.The distribution of the scattering point of the light guide plate was simulated.The optimal distribution of the scattering point of the light guide plate was obtained by optimization design.According to the optimized distribution of the scattering point distribution of the light guide plate,different shapes scattering dots were designed to simulate different light guide plate scattering.The influence of the shape of the dot on the light uniformity and light intensity was been simulated.The third part is the experimental analysis.Through the relevant experiments,the effects of scanning speed,energy and defocus amount of laser etching on the size and shape of the scattering spot were analyzed.The processing experiment of the light-scattering plate scattering dot plate is carried out,and the distribution of scattering dots in the uniform distribution,the simulation optimized distribution and the actual production application are obtained through experiments,and the light uniformity and average brightness of the three are analyzed.Finally,the shape of the scattering point of the semi-ellipsoid and the nearly semi-spherical sphere was experimentally processed,and the uniformity and intensity of the light were analyzed,too.Based on simulation data of Trace Pro software,the optimal distribution of the scattering points of the 55-inch guide plate was established.The light emission uniformity and luminous flux of the light guide plate can reach the best state when the scattering dot shape was semiellipsoid,the value were 91% and 3505.5w,respectively.In the experimental study,the optimal design of the distribution of the scattering point of the light guide plate was better than that of the light guide plate in actual production(up 3%),which is 81.6%,and the average brightness is 5439 cd/cm2.In addition,when the scattering dot shape of the light guide plate was half ellipsoid,the light evenness and average brightness values can achieve 85.8% and 5899.8 cd /cm2,which was also superior to the nearly half sphere scattering dot.In summary,the research results have certain guiding significance for actual processing and production,which helps to improve product yield and reduce research and development costs.