Research Of The Emission Spectroscopy Of Plasma In MPCVD Device

In recent years, the microwave induced plasma has been widely used in plasma coating, etching and surface cleaning. A very important application areas is microwave plasma chemical vapor deposition (MPCVD). In order to understand the microwave discharge plasma reaction process better. it is particularly important to study the characteristics of the microwave induced plasma by analyzing the plasma emission spectrum in MPCVDPlasma is produced using microwave plasma generating device.and the reaction gases are hydrogen and methane.The emission spectroscopy of the plasma which induced by the microwave plasma chemical vapor deposition reactor was colleted by using the multichannel spectrometer which was made by the British company Andor. Then we get the plasma parameters by analyzing the collected spectrumAnd we analyze and discuss the Relationship between plasma parameters as well as the microwave power and reaction pressure.This thesis include:1. The emission spectroscopy of the hydrogen and methane plasma which induced by the microwave plasma chemical vapor deposition reactor was colleted by using the multichannel spectrometer. In the experiment, It shows that the methane gas in the plasma mainly exist in the form of CH, CH-, C2groups. And then study the intensity of emission spectra with various experimental parameters. The results showed that the spectrum intensity of methane plasma increased as the microwave power increased. And with the increase of the pressure, It first rise and then drop.2. The electron temperature Te derived from two lines method by using the H Blamer emission lines. And we analyze and discuss the relationship between the Te as well as the microwave power and pressure. As a result, with the increase of the power of microwave,the electron temperature showed a rising trend, with the pressure response to a decreasing trend. 3. The iron temperature Ti was calculated by using the Doppler broadening of the Ha spectrum lines.As a result, with the increase of the power of microwave, the ion temperature of hydrogen plasma first rise and then drop. And with the increase of the pressure, it shows the same phenomenon.4. We could inform the molecular processes in the plasma by analyzing the line shape of the hydrogen atom.The results show that hydrogen atoms in the plasma is mainly caused by the electronic and molecular hydrogen collisions produced by dissociative excitation.