Ion Implanter Uniformity Improved Design

With the rapid development of semi-conduct integrated circuit technology, the level of integrate is getting higher and higher, size of the components in the circuit smaller and smaller, actually into the nm level. So there's much higher requirement for the equipment.The major setback of improving the semi-conduct equipment is huge amount of investment and the small profit margin at the present. The investors are not willing to purchase new equipments with a large amount of money: for one thing, a second-hand product line costs one fifth of a new one, for another, it really upgrades very fast in the semi-conduct business. The stability and some important parameter of the domestic equipments can't meet the requirement, so second-hand equipments from abroad are very popular with domestic companies. A problem with the second-hand equipment is that they sometimes fail to meet the growing requirement of the clients after running for so many years. The equipment of ion implantation is one of the most expensive and complex in semi-conduct industry. Homogeneity is the most important parameter in the implantation process, so it's extremely urgent to improve on it.The second-hand ion implanter, which imported in 1980s can't meet the need on many suspects. Its homogeneity is about 5%-7%. In order to satisfy the needs of the customers, we have to improve that into 2%.In this article, from the working principle, the factors affecting the homogeneity were analyzed. And the experimental data were simulationthed by Minitab software. A series of improments have been proposed.