Gas Delivery And Heating Control System Design Of MOCVD Equipment

With the continuous development of semiconductor technology, semiconductor materials have been widely used in light-emitting diodes, lasers, optical detectors and high-power electronic devices, especially the wide band gapⅢ-ⅤandⅡ-Ⅵcompound semiconductor material. MOCVD (Metal Organic Chemical Vapor Deposition) is the main equipment to growⅢ-ⅤandⅡ-Ⅵcompound semiconductor films, but for now its domestic research is still relatively limited, so it's worthwhile to do the research on the MOCVD.On the bases of overall research and study on the current domestic and international MOCVD systems, the structure and operating characteristics of the MOCVD system are summed up, methods to control the gas delivery system and heating system of the MOCVD are put forward, and the major research is summarized below:First, working principle, system structure and operating characteristics of the MOCVD have been studied in detail, the design of the new MOCVD system is displayed, and the component parts of the MOCVD and the system working process are introduced.Second, the control methods of MO source cylinder pressure control, Run-Vent pipelines pressure difference control and Run pipeline make up control are put forward.Finally, the characteristics of temperature control system is analysed, advantages and disadvantages of the induction heating and radiation heating are compared, materials of heating resistance and insulator are selected, design of heating furnace based on radiation heating principle are displayed, and structure of furnace cooling systerm is designed.