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Study On The Effects Of Magenetron Sputtering Deposition Parameters To The Integrated Tribological Properties Of DLC Films

Posted on:2010-10-11Degree:MasterType:Thesis
Country:ChinaCandidate:S D WuFull Text:PDF
GTID:2178360272988100Subject:Mechanical design and theory
Abstract/Summary:PDF Full Text Request
DLC films and W doped DLC films were deposited by mid-frequency unbalanced magnetron sputtering system and ion source combined unbalanced magnetron sputtering system respectively for the industrial application and high properties metal doped DLC deposition, effects of the graphite target power and substrate bias voltage to the structure and the properties of the DLC films had been investigated, and so did the effects of the W target current to the quantity of the W containing and to the structure and properties of the W-DLC films. The experimental results are described in details as follows:(1) The DLC films deposited by Mid-Frequency Unbalanced Magnetron Sputtering System had smooth surfaces. With the target power increasing, film thickness increased slightly, content of the sp3 firstly increased then droped down, and to the maximum when the target power was 5-7 kw, which made the nanohardness and elastic modulus had the same change relationship, critical loads of the films and the substrates increased initially to the maximum in power of 6 kw, then droped down. With the substrate negative bias voltage increasing, films thickness decreased, content of the sp3 increased initially to the maximum in voltage of 100 V, then droped down, nanohardness and modulus had the same change relationship with the content of the sp3 changing, critical loads firstly increased then decreased. The DLC films had small friction coefficient and relative good anti-wear properties, which had best tribological properties when the target power was 7 kw.(2) Using ion source combined magnetron sputtering methods, W doped graded composited DLC films had been deposited, which had small surface roughness with Ra was 0.00756~0.02057μm. With the W target current increasing, content of the W increased, content of the sp3 bonding ingradually decreased. WC1-x micro crystal had been generated in the films and increased with the W target current increasing. Nanohardness and elastic modulus of the films changed with depth, which increased from 12 to 28 GPa and from 170 to 310 GPa respectively with the W target current increasing, H/E increased gradually with the W target current increasing too. Adhesion strength of the films and high speed steel substrates increased gradually with the W target current increasing, which were more than 80 N and exceeded 100 N when the W target current in 5 A. In condition of conventional laboratory, usingφ6 mm Si3N4 ball as a counterpart, the mechanism of the films abrasion was abrasive abrasion when the applied load was 200 g and rotation speed was 400 rmp in the ball-disc wear tester, the friction coefficient increased with the W target current increasing, the films had low wear rate which were lower than 517.773 m3/s, and decreased with the W target current increasing.
Keywords/Search Tags:DLC, W-DLC, Mid-frequency unbalanced magnetron sputtering, Ion beam combined magnetron sputtering system
PDF Full Text Request
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