Laser Direct Writing System Of Fabricating High Resolution Diffraction Images With DMD

Different photolithographic systems have been developed in many countries and areapplied in IC fabrication, micro-optical elements manufacture, MEMS, optical inspection,optical security and etc. Therefore, more attentions are paid on lithography systems.HOLOMAKER-Ⅲ-B is a new photolithographic system and possesses good optical andmechanical configuration. From the point view of application, we analyze the system'sperformances in detail and make the optimal approaches in direct writing control software,hardware and photolithographic technologies to improve the performances of this system.Through refitting the laser direct writing(LDW) system Holomaker-Ⅲ-B, usingdigital micro-mirror device(DMD) to replace the original square bore as a spatial lightmodulator(SLM), the system can expose a reduction interferential pattem with any figuredirectly on photoresist plate. The resolution of final diffraction pattem can be achieved upto 6000dpi and a series of high quality diffraction pattems, such as 2D, 2D/3D, 3D imagesand various nicety of tiny figures or letters, can be easily created in this system. Theexperimental results have been given in this paper.Opposite in traditional method of fabricating dot by dot, the Holomaker-Ⅲ-B systemfabricate 2D patterns, 2D/3D patterns, 3D patterns and so on with the array by arrayexposure mode successfully. At the same time, fabricating method of array by array isfaster than the method of dot by dot. Furthermore, it gains the great progress onmanufacture's qualityWith the research on hardware, software of the system and related technologies, weget the processing procedures and experimental parameters to fabricate different elements,which makes HOLOMAKER-Ⅲ-B an excellent direct writing system with higherperformance and lower cost. The research results demonstrate that HOLOMAKER-Ⅲ-B system has excellent performance. Especially, some elements fabricated byHOLOMAKER-Ⅲ-B have been commercialized.