Optimization Of New Photolithographic System And Technology

Different photolithographic systems have been developed in many countries and are applied in IC fabrication, micro-optical elements manufacture, MEMS, optical inspection, optical security and etc. Therefore, more attentions are paid to R&D on lithography systems. SVG-LDW04 is a new photolithographic system and possesses good optical and mechanical configuration. From the point view of application, we analyze the system's performances in detail and make the optimal approaches in direct writing control software and photolithographic technologies to improve the performances of this system.SVG-LDW04 is developed to be the system of optimized configuration, which can fabricate binary optical elements, designed groove gratings, optical variable devices (OVD), vectorgraph, precision image, and so on. Among system's modules, spatial light modulator and double telecentric configuration are used to obtain light spot of high quality; the differential mechanics and CCD are to modulate focus at real time with high precision.On the basis of configuration and software of S VG-LDW04, we seek the method and technologies for fabrication. The first application is to fabricate binary optical elements by using square light spot and then the relief depth is controlled by exposure time. The second application realizes designed groove gratings by shaped light spot in scanning mode; the groove depth is controlled by the size of light spot. The third application is to obtain achromatic OVD by cell pattern exposure mode. Graphics oriented design (GOD) is also proposed to realize achromatic OVD and the fabricated examples are also given.With the research on direct writing control software and related technologies, we get the processing procedures and experimental parameters to fabricate different elements, which makes SVG-LDW04 an excellent direct writing system with higher performance and lower cost. The research results demonstrate that SVG-LDW04 system has excellentperformance and can fabricate precision image, binary optical elements, designed groove gratings, MEMS, and diffraction optical security graphics. Especially, some elements fabricated by SVG-LDW04 have been commercialized.