Monte Carlo Simulation Of The Interactions Of Electrons With Solid

Focusing on an important reason, i.e. the scattering of electrons in solid, which influence the resolution of electron beam lithography, the interactions of electrons and solid are analyzed based on the mechanism of the interactions. A classic continuous energy loss physical model, which is Rutherford elastic scattering and Bethe energy loss model, is adopted to analyze the elastic and inelastic scattering, range, energy loss of electrons injected into solid. According to the physical model, Monte Carlo method is applied to simulate the interactions of electrons and solid. For a given dose of electrons, the energy density absorbed by the resist is determined, and a resist critical energy density model is adopted to determine whether the resist the resist can be developed after electrons irradiation.This paper mainly discuses the problems of realizing the model by computer, which can be listed as follows: (1)The computation flow is defined; (2)The coordinate transformation is realized;(3)Some details like the generation of probabilistic number, the overflow of computation, the utilize of memory, how to program within the number range of matrix of the computing environment are discussed; (4)How to read and store a large number of figures; (5)How to map figures with space;(6)How to plot the figure of electron track, the figure of the energy absorbed by resist, the profile of the developed resist.Analyzing the results derived by computer simulation and experiments, conclusions are deduced.