Study On Coating Technics For 3 Band In 1 Optical System Of Pod

The Optical technique in thin film is an important branch of the modern optical technique. It has an important position in electro-optical field. Along with the development of the precision control and guide E-0 system, target tracking, and E-0 counterwork , the demand is higher and high for optical thin film. It must take on some the multispectral characteristics about optics, except that, it must take on the nicer characteristic of machine, for example the durability.The technique of thin film is a synthesize technique. The study of this paper base on the demand about of Multispectral(visible, infrared and laser) E-0 System, emphasize the design and optimize of antireflection film on CaF₂ substrate, then study of vast coating technices, and analyzed the main factors which affect thin film thickness, then give out necessary measure to deal with them. At last, this paper fetch out researchful intention and significance about broadband three wave-band film (0.7～0.9μm,1.064μm and 3.7～4.8μm). Except that, in this paper, it expatiates film theory and microcosmic process of film coating. As emphasis, the paper introduces the choice of film materials, coating design, and deposition process.The results of measuring turn out that between the idea curve and the practical curve have some errors. Finally, analyze the reasons about error of the result.