Design And Fabrication Of 400-1100nm AR Film

In order to meet the optical instruments' operating requirements of atmospheric radiation systems, namely, it must be high transmittance during visible and near-infrared band, we adopt electronic beaming vacuum depositing method with the aid of ion assistant deposition systems. The structure is designed by TFC software with double efficiency interface theory. Through optimizing technical parameters such as degree of vacuum, basereservoir temperature, evaporation rate of TiO₂ and improving the monitor method, wedeposit the film on the k₉ substrate with four materials of Al₂O₃, MgF₂, TiO₂, SiO₂ .Andmeasured the transmittance of the coating with the spectral photometer, got the spectrum curves of the coating. In condition of vertical incidence, the average reflectivity below 1.5% through 400nm-1100nm wavelength. In addition, the coatmg have successfully passed environmental tests, it can completely meet the demands of atmospheric radiation systems.