Research On "Pen-type" Micro Device Direct Writing Method For Micro-nano Fabrication

Integrated circuit technology,microsystem technology or nanotechnology are collectively referred to as micro-nanotechnology,and micro-nanotechnology relies on micro-nanoscale functional structures and devices.The basis for micro-nano-functionalization of functional structures is advanced micro and nano-processing technologies.The fabrication of micro-nano masks is the main process prior to the micro-nano processing processes such as etching,deposition,and modification,and is a key step and foundation in the micro/nano process.The ability to realize high-quality,efficient,flexible,and low-cost mask manufacturing is of great significance for scientific research and production in micro/nano electromechanical systems,micronanotechnology,micro/nanoelectronic chips,and semiconductor devices.In view of the fact that micro-nano mask manufacturing is mainly based on optical lithography and nanoimprint technology,the process of manufacturing a mask is complicated,and expensive masks or impressions need to be prepared in advance,so that it is difficult to efficiently and flexibly manufacture patterns.Aiming at the current needs and key issues of micro-nano mask manufacturing technology,a micro-nano mask direct writing method based on “pen-type” micro device was proposed,and a complete set of “pen-type” micro device direct-write mask was built by itself.Micro-patterning system for molds,for efficient,low-cost,flexible,high-quality micro-nano mask production.The working principle of the "pen-type" direct-write micro device is studied.The liquid mask material is affected by the surface tension,the gravity and the capillary force of the substrate to realize the writing of the pattern on the substrate.The effects of temperature,density and pressure of the liquid mask material on the surface tension were studied.The curvature radius and stiffness of the pen tip,the tilt angle of the micro device,the contact force between the pen tip and the substrate,the contact time,the writing speed,the direction and other parameters were directly written The size and quality of the impact provide a theoretical basis for the development of "pen-type" micro devices and direct write micro-nano masks.In order to control the size and quality of the mask pattern directly written,the tiny contact force between the pen tip and the substrate needs to be monitored in real time,anda method for measuring the small contact force using a micro pressure sensor is proposed.The working principle of the pressure sensor is studied,the mechanical model of the micro contact force measured by the pressure sensor is established and simulated,then the feasibility of this method is verified through experiments,and the relationship between the output voltage of the pressure sensor and the position and size of the contact force is obtained.It enables low-cost,flexible,and convenient measurement of small contact forces.The use of sugar as a mask material,reactive ion etching technology for high-altitude pyrolytic graphite etched to 3.4 nanometers below the atomic-level graphite layer structure.For the subsequent use of mechanical stripping method to provide a controlled number of layers and regular shape of graphene provide research basis.The micro-nano mask direct writing technology proposed in this paper can also be applied to the micro-nano processing and the preparation of micro-nano devices,which has very important significance for the development of micro-nano fabrication.