Fabrication Reaserch Of Micro/Nano-Structure Based On Nanoimprint Lithographing

Nanoimprint lithography?NIL?is a non-traditional technologies and also as one of the next generation lithography technologies.It is mainly used for fabricating micro/nano structures for low cost,ultrahigh resolution and high-throughput.Compared with traditional optical lithography or electron beam lithography,NIL take advantage of mechanical force to transfer the pattern from the mold to the embossing resist.The resolution of pattern is only related to the template and can therefore achieve resolutions beyond the limitations set by light diffraction or beam scattering that are encountered in conventional techniques,thereby can obtain a more accurate micro-nano pattern.This paper focuses on the unique advantages of nanoimprint technology in the field of micro/nano structures'preparation,such as low cost,ultra high resolution and production efficiency.The application of NIL to prepare micro/nano structure is studied.The main purpose is exploiting nanoimprint technology to the prepare different micro/nano structures and achieving the low cost,high resolution and large scale.The main research contents and results of this paper are as follows:1.This paper try to exploit NIL to prepare transmission grating of ultra-high resolution.Firstly,a silicon-based template of grating with a resolution of 70nm was prepared by combining e-beam lithography and lift-off.Then,a transmission grating of 70nm resolution was fabricated on a SiO₂ substrate by NIL successfully.It can confirm the the feasibility of taking advantage of NIL to prepare utral-high resolution grating with low-cost and large-scale preparation.2.A three-layers micro-scale channel and two-layers nano-scale channel structures were successfully fabricated by repeating the embossing and etching experiments on the same substrate.In terms of the micro-scale channel,the width of the first layer is 4.58?m and the height is 109.2nm;the width of the second layer is1.578?m and the height is 143.3nm;the width of the third layer is 838nm and the height is 122.9 nm.For the nano-scale channel structure,the width of the first layer is 167 nm and the height is 100 nm;the width of the second layer channel is 46.51nm and the height is 100 nm.And the experiment shows,by changing the feature size of the silicon-based template of grating,the multilayer channel with different feature sizes can be prepared.In a word,this paper provides a new idea for large-scale industrial production of multilayer channel structures with low-cost and high efficiency.3.Based on the method of photoresist hot melt,the structure of micro-nano lens array is prepared by NIL.A nanolens array structure with the aperture is about300 nm and the height is about 120nm was prepared on a silicon substrate.Solving the problem that the conventional lithography technology is difficult to prepare nano-lens array due to the limitation of exposure wavelength.The application feasibility of NIL in the field of micro-nano lens array structure preparation is confirmed,and it is expected to realize the fabrication of micro-nano lens array structure with low-cost,high-efficiency and large-scale.