Theoretical And Experimental Research On The Mechanics State Of The LSPR Contact Probe

With the development of the semiconductor industry, the feature size of the semiconductor is required to be made smaller and smaller. Lithography technology is be used as one of the key technologies of manufacturing semiconductor devices. However, the lithography resolution restricts the feature size and properties of semiconductor devices and the traditional lithography resolution is limited by the optical diffraction limitation. In order to break through the optical diffraction limitation, the related field experts have been found a new lithography technology which is Localized Surface Plasmon Resonance(LSPR) contact lithography.In this paper, this study roots in the "the development of nano direct writing experiment platform", which is the open project of the national key laboratory of a research institute. This project is to achieve the mechanical and electrical parts of the LSPR contact lithography system. In order to ensure the quality of lithography, the mechanical state of the key components probe must meet stringent requirements in lithography process. This paper aims at studying how to guarantee the mechanical state of the probe in lithography process through theoretical analysis, structure design and debugging experiment, etc. In order to guarantee the quality of lithography, the probe must meet following requirements:(1) the scan angle of the probe less than 100 μrad;(2) the magnitude of the angle fluctuation of scan angle is less than 20 μrad;(3) the contact pressure must not exceed the photoresist maximum limit 220 MPa. Due to the optical structure and technical restriction, the probe is made into a separate entity. Thus, it is need to adopt a holdup structure to ensure its mechanical state. Due to probe angle, licensing displacement amount and photoresist surface contact pressure form contradictions. Under the restriction of metal material elastic modulus, yield strength, the structural design of the holdup become difficult and it is need to design ingenious structure to meet the requirements.This paper analyzes the factors that affect the mechanical state of the probe when it is in working and draws the conclusion that the mechanical state of the probe is mainly affected by probe mechanical structure and the external factors. And we found that holdup structure of the preliminary design is unreasonable. Then according to the index requirements and experiment results, this paper optimized the mechanical structure of the probe through the arm width, thickness and the height of the probe. Then it analyzed the external factors that may affect the mechanical state of the probe through the theoretical simulation.This paper finished the probe mechanical optimization design and simulation analysis, the construction of the experimental platform and the calculation of the assembling error which can provides error compensation value for later experiment, so as to ensure the accuracy of experimental results.Finally, this paper analyzed the external factors which may affect the mechanical state of the probe through the experimentation to set uniform experimental parameters standards for later experiment. And it analyzed the influence of the probe mechanical structure on the mechanical state of the probe. And the experiment result proved the optimized probe structure can meet the requirements of the mechanical state of the probe in the lithography process.