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Research On Deformation Detection Of Local SP Lithography Contact Direct-Write Probe

Posted on:2016-06-07Degree:MasterType:Thesis
Country:ChinaCandidate:Z B HanFull Text:PDF
GTID:2308330473455251Subject:Mechanical and electrical engineering
Abstract/Summary:PDF Full Text Request
The development of optical lithography technology has been for decades, and has made a significant contribution to the continuation of "Moore’s Law". However, optical lithography technology will eventually be abandoned because of its reach of technical limit and soaring coats. So people have been trying to seek a new method or technology, which it can improve the lithographic resolution with high efficiency and low cost. Direct-write lithography technology which based on the contact surface plasmon is a research hotspot in recent years. Because of its low cost, fast and flexible features, this lithography technique is particularly suitable for needs of small batch, single nanometer graphics production. It has good development value for the production of increasingly strong demand nanostructures in product development stage. The subject comes from the national key laboratory open fund "Design and scanning performance analysis of local SP lithography contact direct-write probe". According to the subject requirements, we need to design a feasible detection scheme to detect the micro deformation of the probe in the process of direct writing lithography, which is prepare for the further study of how to control the gesture of probe during the scanning process.In the second chapter, the structure of the contact direct-write probe and the direct write lithography process are introduced. On the basis of simulation analysis of the students in the group of subjects, we further study on the effect of the probe posture deflection with various external factors during the scanning process. Then the probe posture deflection angle is proposed to be the specific detect targets.In the third chapter, two kinds of ideas included capacitance method and beam deflection method have been analyzed. Specifically, beam deflection method is applied to detect the probe posture deflection through mathematical modeling and numerical simulation. By comparing the two methods, beam deflection method is selected to be the more viable method we will use.In the fourth chapter, the overall detection scheme design has been carried on, and the type selection of light source and optical detection module is completed after analysis. According to the requirements of measuring range and resolution in subject, optical structure design, He-Ne laser selection, spot calculation, PSD parameter calculation and selection are gradually completed.In the fifth chapter, data acquisition module software of PSD output signal is desiged, which is based on the LabVIEW and data acquisition card USB6008. The LabVIEW data acquisition processing program is writed, which is used for the fellow-up testing experiments including system calibration, stability and background light effect.Finally, the building of experimental platform is briefly introduced. Several factors affected the accuracy of the experiment are analyzed, and the corresponding improvement measures are put forward.
Keywords/Search Tags:surface polaritons, lithography direct-write probe, posture deflection detection, beam deflection method, error analysis
PDF Full Text Request
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