Research On Ti-based Nanocrystal Preparation For Non-volatile Memory Application

As the technology node of Integrated Circuit continuesly evolving, the traditional floating gate and SONOS memory meet their intrinsic limitation. Hard to keep shrinking. As a possible replacer, silicon or metal nano crystal memory already draw comprehensive attention.For the nano crystal memory, how to get a suitable nano crystal that has the desirable density and size is key. This paper will cover the researching on the Ti based metal nano-crystal manufacturing, and mainly describs a new and simple method, vapor deposition process(PVD or CVD) direct formation method, to get uniform and high density Ti based metal nano-crystal.Further more, for nano crystal, the detection and measurement method is also important. Besides the trational SEM and TEM, this paper also introduces a new electrical isolation and storage characteristic detecting way on Quantox, which is a simple nano-crystal monitor method which can be used in the future real production.The nano crytal making and detecting method mentioned in this paper are also expected further usage in the furture nano-crystal memory manufacture.