The Study Of The Preparation Of Silicon Dioxide Antireflection Coating By PECVD

With the advancement of technology and the needs of modern industrialization, silica its excellent performance has been widely used in various aspects. In the electronics industry to be a good conductive material is used to manufacture the optical aspects of the various properties and types of coatings; become coated on the above different types of devices and increased pellicle light absorption and penetration properties of the film; in the field of optoelectronics, silicon solar cell surface is also coated with a silica coating to increase the photoelectric conversion rate. Currently in the field of thermal power generation, solar collector material is selected borosilicate glass, its transmittance is now substantially limit has been reached, and the silica was prepared as a coating film coated on its inner and outer surfaces to increase the permeability the reflected light is reduced by the loss of light. Silica prepared so that it is widely used a greater amount of preparation method is not limited in the past various physical deposition method such as sputtering, vacuum evaporation, and the sol-gel method and the oxidation method, a broader approach is chemical vapor deposition. Compared to conventional vapor deposition, PECVD (plasma enhanced chemical vapor deposition) method because of its distinctive technological superiority has become the primary means of research, preparation of the coating. PECVD method is simple, the coating film surface was smooth, no obvious defects, performance is very good.This paper discusses the basis for the development of thin film materials and SiO2antireflection coatings prepared by conventional methods, focuses on the principles of PECVD SiO2antireflection coatings prepared, structure and working principle of the establishment,laboratory equipment experimental system, discusses the gas pressure,deposition time, RF power and other parameters on the performance antireflection film,and the experimental results were surface morphology, structure and optical performance analysis.Experimental results show that the design and manufacture of PECVD experimental system on the success of different matrix materials prepared SiO2film. The light transmittance through the film annealed glass can improve by2.93%, improve the optical performance of solar collectors cover tube.