Fabrication Of Subwavelength Structured Antireflection Coating Based On Ultraviolet Nanoimprint And Anodic Aluminum Oxide

Ultra-violet Nanoimprint Lithography is a low cost, high resolution and high throughput technique. The resolution of pattern is mainly up to the resolution of template. The pattern on the template is fabricated by Electron Beam direct-write Lithography or Extreme Ultra-Violet Lithography which has very high resolution but high cost and too small speed. The Anodic Aluminum Oxide template has highly ordered holes arrays. This kind of template can be maturely fabricated and its parameters can be modulated easily. It is the first time to take the advantages of both Ultraviolet Nanoimprint Lithography and Anodic Aluminum Oxide template to fabricate subwavelength structure. This kind of structure can be assembled on the Photoelectric device'surface as antireflection coating which can improve the work efficiency of photoelectric device. The subwavelength structured antireflection coating fabricated by this original method can reduce reflectivity from more than 30% to 4%.