Magnetron Sputtering Target Surface Electromagnetic Fields Intelligent Control And Etch Uniformity Study

Ordinary magnetron sputtering often exists the problem of uneven etching and the low efficiency of the target, and this paper studies a new method for etching by changing the additional electromagnetic field of the magnetron sputtering. This method is achieved for controlling the magnetization current of magnetic winding during the magnetron sputtering and making the varying magnetization current which comes from magnetic winding to play a role. In the effect of the additional changing magnetic field, the etching surface of the target is better than the uniform magnetron sputtering. The depth of the etching is Increasing gradually from the edge to the middle, and there is not the obvious etching ring in the surface of the target. Therefore, this kind of configuration has improved the uniformity of the etching and the utilization of the target.The magnetization current must be controlled by the magnetization current depended on an intellective method to control the etching pattern of the magnetron sputtering . Therefore, A kind of pulse generator to control the magnetization current is designed in this subject. Associated with the device which name is"nonequilibrium magnetron sputtering film plating machine", the disquisition is begun around the theme which was"the intellective control of target's electromagnetic field during the process of the magnetron sputtering and the research about the evenness degree of the etching",and a feasible method and the circuit design is raised.The laboratory experimental data of the plan is handled by the application of regression analysis and modeling. The control system and the experimental data are analysed by LabVIEW 8.2 software with the virtual instrument design. The designed virtual instrument is used for the pulse control signal and the application of regression analysis of the experimental data in this paper. Among them, the virtual instrument's main work for the pulse control signal is setting the control signal,displying signal,showing the various performances under such a control during the process of the magnetron sputtering, and also displaying the present data. On the other hand, the main work of the virtual instrument used in data acquisition is to complete the application of data and statistical regression analysis. After then, the virtual instrument should make the linear fitting chart, distribution chart, the prediction and estimation of the data, and also the presentation of the data in a variety of experimental conditions.