Based On The Stretch The S5000 Intensive Sampling Imaging Algorithms

Optical Proximity Effect(OPE), as a technical terminology, usually refers to all of the undesired pattern vs. layout distortions caused by mask making, optical lithography and etching. To compensate OPE for better manufacturability, various Resolution Enhancement Technology(RET) methods based on layout correction and mask phase assigning have emerged.With the increased design complexities brought in by applying different RETs, post-RET sign-off verification is quickly becoming necessary. Among all those types of manufacturability checks, some have to be carried out by using information from Dense Silicon Imaging (DSI). However, the computational efficiency of DSI should still be improved.Based on the studies of DSI, we analyzed the key points which effect the computational efficiency of DSI, and then improved it with the stretch S5000 Software-Configurable Processor. The implementing of DSI based on S5000 greatly improved computational efficiency and put sign-off verification verifications based on DSI into practice. In this paper, we also made an introduction to the Stretch S5000 Software-Configurable Processor, the example of implementing DSI with S5000 shows it can be used in compute-intensive applications.