| A unique ultra high vacuum (UHV) facility has been developed for the microscopic investigation of laser induced damage to thin films. Pulsed laser damage of thin films is, in general, initiated by the absorption of laser radiation by surface imperfections and contamination due to fabrication techniques, surface cleaning, handling and/or polishing. The new facility eliminates many of the damage initiators by incorporating the thin film growth capability in the same UHV environment as the damage testing thus providing reproducible high quality coatings facilitating the isolation of microscopic damage.;The current studies have investigated the laser induced damage thresholds (LIDT) of silver films (100A;Results from the highly controlled testing environment has led to a new approach to the enhancement of the LIDT of silver mirrors. Electron emission has been shown to be a precursor to high energy plasma development and ensuing surface damage. Application of large external negative electric fields (... |
