Research On The Laser-induced Damage Characteristics Of A Novel Oxyfluoride Glass Under Ultraviolet Nanosecond Laser Irradiation

The ultraviolet nanosecond laser-induced damage of laser components is always the bottleneckproblem that limits the development of laser technology. Therefore, the study of the laser-induceddamage mechanism of optical components, including the surface damage and bulk damagemechanism, exploring the mechanism of the damage growth and improving the damageperformance of the optical components are the important issues in high power and high energy lasersystems.The research on the damage of fused silica endured the scientists decades of years, however, thestudy on laser damage of oxyfluoride glass (OFG) have rarely been reported. In this paper, theresearch on the oxyfluoride glass will inject fresh blood to the mechanism study of laser induceddamage, and can be of the great significance to the exploration of novel high damage thresholdoptical materials.To solve the damage problem of oxyfluoride glass under ultraviolet nanosecond laser irradiation,we investigated the surface damage and bulk damage of oxyfluoride glass and fused silicarespectively based on the comparative principle.Besides, we analyzed the damage morphology and damage mechanism in this paper. Meanwhile,the damage growth of oxyfluoride glass and fused silica were explored respectively, includingdamage growth threshold, growth factor and the relationship between the damage growth and initialdamage scale. In addition, the damage growth mechanism of the optical material was described.At last, we studied the absorption of optical materials and fatigue effects caused by absorption,and explained the fluorescence phenomenon in oxyfluoride glass under laser irradiation,additionally analyzed the difference of damage between the two kind of material from the aspect ofabsorption.In this paper, the understanding and knowledge about damage mechanism and damagemorphology of optical components, as well as the investigation of damage growth mechanism undersubsequent irradiation, and will be of great importance and a significant guidance to thedevelopment of novel optical materials.