The Design Of Dust And Impurity Detection System On Mask Surface

With the development and improvement of industrial technology,mask has been widely used in lithography.However,in the process of manufacturing and transportation,dust and impurities tend to accumulate on the surface,which affects the detection accuracy of conductor living semiconductor.Ensuring the surface cleanliness of each mask is of Paramount importance to developers and manufacturers.This paper analyzes the shortcomings of manual dust detection on mask surface,designs a set of dust detection system based on machine vision technology on mask surface,studies the detection system,improves the accuracy of the detection system,and makes the detection of dust on mask surface more convenient.The research content mainly includes the following aspects:1.Defects in the mechanical structure design of the mask overturning detection platform were studied,and the supporting arm,lead screw,coupling and motor of the mask surface dust and impurity detection platform were studied and selected.2.Analyzed the image acquisition system of the dust and impurity detection system on the mask surface,and improved the selection and design of LED light box,CCD industrial camera,distance sensor and pressure sensor of the image acquisition system.3.Build a virtual dust detection instrument for the mask surface based on LabVIEW,extract colors of different planes from the collected images,obtain the gray scale map of the mask surface,and apply histogram equalization to realize gray scale image enhancement,so as to achieve the purpose of dust detection on the mask surface.