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Research On The Fabrication And Properties Of Micro/Nano Grating

Posted on:2014-02-13Degree:MasterType:Thesis
Country:ChinaCandidate:C C LuoFull Text:PDF
GTID:2248330392961534Subject:Electronic Science and Technology
Abstract/Summary:PDF Full Text Request
Firstly, this article introduced some latest development of severalbasic Micro-Optics, such as micro lens array, micro mirror, optical switch,and grating, especially subwavelength grating. Because the main subject ofthis thesis is about fabrication, so some newest microfabricationtechnologies are also illustrated. Then we will acquaint with whatresearchers are put emphasis on.Then, the special reflection effect of subwavelength grating has beenanalysed by RCWA and EMT respectively. Thanks to the software RSoftwhich is based on RCWA, we conducted the analog computation about theimpact of structure parameter on reflectivity conveniently.Mention to the experiment part, we demonstrated two manufacturingprocesses, X ray lithography and electron beam lithography. As a result,two high aspect ratio subwavelength gratings were fabricated,500nm inperiod, about8in aspect ratio, and666nm in period,2in aspect ratio. Thecreativity of our job is that photo resist NUC APZ6633was introduced asthe interlayer, insuring the side wall’s perpendicularity. And the newetching method FAB also has the same function. Then in order to explorethe replication property, we use silicon mold as master, high qualitypatterns are obtained on PDMS, PLLA, and PS wafer respectively. Theresult showed that they are available for the nano-imprinting technology.And PDMS can be made into variable pitch grating within variation rangeof0-20%. Finally, the pre-research work about grating on curve surface isdemonstrated.
Keywords/Search Tags:Grating, Subwavelength, X ray lithography, Electronbeam lithography, Replication of molds
PDF Full Text Request
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