Research On Micro-Nano Waveguide Grating And Its Manufacture Methods

With strong selective reflection to a narrow wavelength bandwidth, Bragg grating structure gains wide application in developing fiber communication system, especially in wavelength-division multiplexing system. It is widely employed to fabricate optoelectrionic devices, such as optical filters, semiconductor lasers, optical fiber sensors and so on. As to some extent, the performance of these devices is mainly depended on the quality of embedded waveguide Bragg gratings, and as a sequence, efforts to reduce cost and simply fabrication process of the Bragg gratins have been continued since it inventedNanoimprint lithography has been introduced as a new method to manufacture gratings with good manufacture quality, low cost and high throughput. In this paper, based on nanoimprint lithography, a research on the manufacture process of Bragg gratings for DFB and tunable DBR lasers is carried out, including process improvement and related simulation, the detailed work is shown as follows:(1) A brief introduction to the Bragg gratings is given at first, including structural features and basic theory. And then, some typical traditional manufacture methods and their characteristics are reviewed.(2) The process flow of nanoimprint lithography and requirements on materials that used during imprint process, are introduced.(3) Some significant improvements to the imprint error tolerance and filling ability of resist are made by introducing a special intermediate polymer stamp and a modified imprint flow process, besides, the etching process is analysized and kinds.(4) Nanoimprint lithography is used to manufacture distributed feedback semiconductor laser, and the errors during the manufacture process are studied.