Research On Electroosmotic Flow Driven Nanoimprint Lithography

LED graphical industries has a great demand for large area nano graphic. But existing micro-nano-manufacturing technology can’t meet the need of industrial scale production. Nanoimprint is regarded as the most potent implements in all of the large area nano-graphic technology, but the traditional large-area nanoimprint technology can’t solve the problem of warp fragile substrate and uneven filling. This paper presents a new way of nano-imprint lithography which is driven by electroosmotic flow. We use electroosmotic force “pulling” photoresist into mold cavity rather than traditional nanoimprint lithography "squeeze" photoresist into the mold cavity. I am trying to solve the problem of warp fragile substrate and uneven filling for nanoimprint, especially the large-area nanoimprint.Propose a PDMS-based soft mold structure driven by electroosmosis full wafer nanoimprint technology. We use electroosmotic flow driven rather than mechanical pressure to drive the polymer to flow. This method effectively pro-test a large area Nano imprint in the warp, of fragile substrates. In this chapter I analy-ze the principles of electroosmotic flow, refer to applicationof electroosmotic flow in Micr-ofluidic chips, combine traditional large-areananoimprint mechanical printing press characteristics, finally the field strength required and filling time were derived for driven by electroosmotic flow nanoimprint instead of traditionalUse the multiphysics simulation software COMSOL Multiophysics to build the mold of electroosmotic flow driven nanoimprint,and parameters affecting this filling process are analyzed. According to the analysis, reach the conclusion: Velo-city characteristics of the photoresist into the mold cavity is from fast to slow, gene-rally filling fast; Electric field strength larger or deeper the mold cavity, in equal time, this is more complex highly photoresist. This factors such as the width of the mold cavity, Viscosity and density of photoresist have limited impact on photore-sist height, Obviously the impact can’t match the impact of the electric field inte nsity and the depth of the mold cavity on photoresist height.After analyzing the finite element results,we design an experimental plat-form in order to verify the accuracy of the finite element results. Analyze the experimental platform for different programmers to finalize a set of optimal experiment plan. The platform is as follows: The combination of transparent con-ductive PET and PDMS is used as a print template, Sapphire glass is used as the substrate, New photoresist can meet the requirements of UV imprint and can contact with the template form electric double layer after deployment. taking in-to account the particularity of laboratory equipment,Make the parent template with porosity, Then propose a method for producing a composite formwork com-bination of transparent conductive PET and PDMS.