Primo D-RIE is a kind of Dielectric Plasma etcher which is made in China by AMEC.The paper introduced the process development on the tool and solved the problem after it applied to massive production.The processes included Dual damascenes etch,1st and 2nd passivation etch.The author developed the process flow to enlarge process window for free from micro trench or fence when kept good physical profile during trench etch;used brand-new method “AIO(all in one)” etching process in 1st passivation etch,which saved more than 50% cost;extended chamber MTBC(Mean Time between Clean)from 80 RFh to 130 RFh by implemented showerhead cleaning process in 2nd passivation etch,meantime reduced wafer scrap ratio caused by surface particle defect from 0.03% to 0.Conclusively,the paper proved that The AMEC Primo D-RIE,which is made in China,is fully capable of advanced semiconductor manufacturing. |