Research On Equipment's Internal Flow Field For High Accuracy Temperature Control

Micro-environment directly affects the performance of high-precision inspection equipment.Temperature fluctuation is one of the key factors.There are many factors that affect the temperature fluctuation.In this thesis,the temperature field of the lithography detection platform is analyzed and studied to meet the temperature control need.The research work and conclusions achieved are as follows:After analyzing the heat characteristics of the lithography detection platform,a temperature control solution was proposed: using the compressor for rough temperature control,and using the electric heater for precise temperature control.Based on that,the micro-environment control system's scheme was designed.Then,the mechanical structural of the temperature control module and the air bath module was designed.The numerical simulation of the air bath module was carried out,finding the relationship between the inlet flow velocity,the outlet pressure and the uniformity of the air bath module.The increase of the inlet flow velocity and the outlet pressure decreases the uniformity of the flow field.The relationship between the inlet flow rate,the size of the outlet and the uniformity of the air bath is also obtained.The increase in air flow rate will decrease the uniformity of the flow field,while the increase in the size of the outlet will make the flow field more uniformTo make the flow field distribution more uniform and reduce the projection objective lens distortion.The best parameter of many factors is obtained,such as the inlet flow velocity,the outlet pressure,the inlet flow rate and the outlet size.Under the effect of the best combination of parameters,the temperature field of the mask in the case of internal heat source is analyzed.The results show that under the influence of those optimal parameters,the temperature of the mask table can meet the control requirement.The prototype was build and tested,the prototype can achieve the temperature stability of 22±0.2?.The micro-environment control system designed has been successfully applied to the lithography detection platform.This technique is equally applicable to other precision equipment that requires micro-environment control.