Study On Key Technologies In UV-LED Fiber Lithography System

Maskless lithography is a important directions of lithography,and using maskless lithography to make design doesn't need to change the expensive mask,just modifying the data in the computer,which is very suitable for the production of in single-piece, small-batch, developing new products, institutes'experimental research.The lithography is a research hotspot in recent years.The paper emerges the UV-LED and optics fiber technology ,puts forward a new maskless lithography system which is based on UV-LED and optics technology,and have the advantages of miniaturization, low-cost, simple structure,have impotant tudies on a miniaturized, low-cost, simple structure maskless lithography system. This work has important research significance.After analyzing a variety of non-mask lithography technologies,,the paper analyse the advantages of UV-LED as lithography light sourse , carries on the light source design, lithography syetem optical design ,scanning system design ,and so on. In optical design,the paper taks into account the light source coherence , introduces the partial coherent theory.To achieve the most simplified structure, all optical path uses single lens to do. Finally,the paper does the lithography experimental research.The primary work of this paper is as follow:①According to the driver and thermal characteristics,and the system requires,design the driver driving circuit, brightness control circuit,and cooling device.②According to the optics characteristics ,designs the optical collimator, according to the collimator beam designs fiber coupler. Designs the focus optics ,and analyzes the result with the theory of partial coherent. In theory, infer the dual fiber detection of defocus amount formula in detail, and discusses the focusing search method.③Carry on the design to the scanning system, focusing on the choice of key component, determine the overall scanning scheme,and design the scan motor's drive and control circuit.④Do the experimental research of lithography,after exposure and develop, make the microporous queues successfully, Obtains a method to make the misropore connection, and anasyzes the result in detail.