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Preparation And Properties Of Aluminum-Doped Zinc Oxide TCO Thin Films On Flexible Substrate

Posted on:2017-11-01Degree:MasterType:Thesis
Country:ChinaCandidate:H M WangFull Text:PDF
GTID:2428330512461294Subject:Electronic Science and Technology
Abstract/Summary:PDF Full Text Request
This article describes the RF magnetron sputtering technique in polyethylene terephthalate?Polyethylene terephthalate,PET?sputter deposition of aluminum-doped zinc oxide substrate?ZAO?thin films,by modulating multiple process parameters?substrate temperature poly-75-250?,sputtering power 80-170 W,working pressure0.2-3 Pa,substrate material?ZAO films by X-ray diffraction?XRD?,UV-visible spectrophotometer?UV-Vis?,scanning electron microscope and four-point probe resistance measuring instrument were to characterize the microstructure and optical properties.The results are as follows:1)ZAO thin film having a hexagonal prepared wurtzite structure,good C-axis preferred orientation on a flexible substrate.2)In the power changing test parameters in the sample is higher than the power of100W,the grain size increases with sputtering power decreased,However,the resistivity increases;the increase in the visible range of the transmission power is reduced,reducing the average transmittance of from 85 to 74%,with the power increase instructions cause the film increase in thickness,while the high-energy particles to damage the flexible substrate microstructure intensified,but its transmittance declines.Film samples obtained at the time of 100W photoelectric best performance:a low resistivity to 5.1×10-4?·cm,average transmittance of 85%.3)the sample with increasing substrate temperature,the resistivity increases,after the grain size decreases and then increases;a substrate temperature of 100?,the grain size uniform,smooth surface resistivity can be low 5.32310-4?·cm.The band gap of the sample is higher than the intrinsic ZnO,which is also a sample in the visible range of high transmittance reason.4)All samples transmittance of 85%or more,the resistivity 10-3?·cm or less.Samples with increasing work pressure,argon ion number density,ion energy is reduced,the energy obtained by bombarding the target sputtered particles is changing,leading to a rear grain size decreases and then increases again decreases,and the resistance reduced the lead after the increasing trend;operating pressure 1Pa the grain size is more uniform,smooth surface resistivity as low as 5.3×10-4?·cm.Band gap all experimental samples were higher than the intrinsic ZnO,high visible light transmittance.5)By RF magnetron sputtering ZAO films under the same conditions,respectively,on the glass,PET,explores the influence of substrate materials and thin-film crystal optical properties.We found a greater effect on the substrate material properties of the films.
Keywords/Search Tags:ZAO film, RF magnetron sputtering, PET substrate, Transmittance, Resistivity
PDF Full Text Request
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