Research On Control System Of Vacuum Coating Machine

Magnetron sputtering is a widely used coating method.Magnetron coating equipment with high quality coating,the short process,vacuum degree of the coating process can be flexibly grasped and other advantages.In this paper,the control system of vacuum magnetron sputtering coating equipment for printing and packaging plant is researched,the coating equipment control system research and design.Coating computer control system mainly includes the target power,the target electrode,vacuum,water-cooled equipment,electrical control system,and current and voltage,temperature,gas flow,pressure and other automatic measurement system.In this paper,vacuum coating equipment and magnetron sputtering coating process in-depth analysis and research.According to the coating process,the distribution of the target magnetic field and the dynamic process of the ion dynamic response were analyzed.The design of vacuum coating machine control system of the overall program,select the S7-300 PLC as the core of the control system to achieve the logic control of the various sub-systems and on-site data collected for processing.IFIX configuration software was chosen for the host computer monitoring system design,alarm interface design,and through the MPI and Siemens PLC communication to read the field data.The dynamic display of the parameters of the production process and the recording of historical data are completed,achieve the purpose that operation the control system at a long distance.Vacuum magnetron sputtering coating machine is by inert reaction gas ions through the role of electric field to high-speed flying target and bombarding the target and sputtering coating.The dynamic response of the ion current is an important part of the magnetron sputtering coating process.As the sputter coatingwith non-linear,time-varying and so on,there are many difficulties in the analysis and control of the dynamic response process of ion current during coating process.In this paper,the traditional PID parameter fixed algorithm is improved for the dynamic response process of the magnetron sputtering process,the effectiveness of the adaptive PID controller is verified by simulation analysis.Through the design of computer monitoring system to complete the dynamic control of coating process and achieve automation,improve the efficiency of coating and factory management level.