The Characteristic Parameter Detection And The Research Of The Surface Properity In Large-area Bionic Structure Surface

In this article, based on the laser interference lithography with the advantages of low cost, high efficiency and high resolution. The laser interference experiment was carried in the surface of single-crystal silicon and amorphous silicon thin film, then achieved the large-area interference patterns. At last, characteristic parameters was detected and then further researched the effect of reflectance on the visible light and surface wettability when the parameters changed.Firstly, this thesis presents the research background and the research process of antireflection and superhydrophobic for two biomimetic structures, it summarize the detection method in domestic and foreign which can be used for parameter detection in material surface. Then, the principle of laser interference is briefly introduced and then used the software of MATLAB to simulate the result of three-beam, four beams, six-beam laser interference. By controlling the related interference parameters which include the angle of incidence, spatial angle, polarization, etc. the light intensity distribution curve, the patterns of light intensity in two-dimensional and three-dimensional is obtained, respectively. A three-beam, four-beam, six beam interference system is build, which is used to do experiments in single-crystal silicon. In order to modify the amorphous silicon thin film and make it present a good anti-reflection. Research the components of the system of large-area mosaic hardware and software system and the control process. The reasonable parameter is set for using two dimensional micro displacement platform for large area splicing experiments, so as to realize the preparation of large area of the bionic structures. With the help of a scanning electron microscope(SEM), atomic force microscopy(AFM), the characteristic parameters of the surface of a single crystal silicon and amorphous silicon thin film can be tested after laser process. Then the reflectance measuring instrument and the contact angle measurement instrument is used to measure reflectance and contract angle in silicon and amorphous silicon thin film which is modified, analyzing the impact of anti-reflective and wettability for various parameters.